Various surface/interfacial micro/nanostructures have been widely used in solar cells 1,2,3,4, light emitting diodes 5, surface wetting and adhesion 6,7,8, metamaterials 9,10,11,12, cell biophysics 13 ...

One of the main challenges in developing semiconductor chip technology is making electronic components smaller and more effective. This difficulty is most noticeable in lithography, which is the ...

Extreme ultraviolet (EUV) lithography is at a critical juncture. After several delays and glitches, EUV is now targeted for 7nm and/or 5nm. But there are still a number of technologies that must come ...

For years the IC industry has worried about a bevy of issues with the photomask. Mask costs are the top concern, but mask complexity, write times and defect inspection are the other key issues for ...